Table of Contents

Foreword

• 1 Introduction
• 2 Manufacturing
  • 2.1 Silicon
  • 2.2 Oxidation
  • 2.3 Lithography
  • 2.4 Ion Implantation and Diffusion
  • 2.5 Etching
• 3 Semiconductor Properties
  • 3.1 Conduction
  • 3.2 Semiconductor
  • 3.3 Doped Semiconductors
• 4 Diffusion
  • 4.1 Physics of Diffusion
  • 4.2 Diffusion Processing
    • Mathematical Modeling: Pre-Disposition
    • Mathematical Modeling: Dopant Deposited
    • Mathematical Modeling: Dopant Profiling